nProber III / Flexprober

Integrated & Optimized solution for 7nm

The FEI nProber III, flagship product in the NanoWorks® product line, is designed and optimized to electrically probe sub-10nm features on semiconductor devices with superior ease-of-use and throughput.

Flexprober is capable of 28nm technology probing

Integrated solution

The nProber III is comprised of a state-of-the-art nanomanipulator integrated into a high resolution and highly accurate low keV SEM, capable of sub-200 eV imaging at low beam currents. Data acquired via the probes is interpreted using an industry standard parametric analyzer.

• Electrical Probing quality - Stability & Repeatibility

The nProber III incorporates a unique advanced anti-contamination system, the Optimizer®, which automatically and rigorously cleans the SEM chamber and the probe tips, thus enabling the system to achieve low noise measurements with better than 200 fA accuracy.

• Efficient Probing – Landing & motion capabilities

The nProber III employs a semi-automated process flow for higher throughput and ease-of-use. Eight encoded positioners may be placed with 2 nm resolution probe steps. The XYZ encoded center stage provides step and repeat capability, while allowing the probes to remain in registration while the sample is moved to the next bit, making the nProber ideal for probing repetitive structures on a device-under-test ( DUT).

An easy-to-use Windows based software platform seamlessly integrates all components of the nProber III. The Field Emission Scanning Electron Microscope (FE SEM) provides the optimal beam shift resolution, video rates, vacuum technology, and user control required for IC nanoprobing. The nProber’s electrical characterization system is specifically designed for low-noise measurements.

• Flexible configuration allowing multiple applications

New features : High Speed Pulsing, EBIRCH

Contact us if you want more detailed description on our solution

nProber III is a FEI EFA group solution